Tetravalent Doping of CeO2: The Impact of Valence Electron Character on Group IV Dopant Influence

D. E. P. Vanpoucke*, S. Cottenier, V. Van Speybroeck, I. Van Driessche, P. Bultinck

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

Original languageEnglish
Pages (from-to)258-266
Number of pages9
JournalJournal of the American Ceramic Society
Volume97
Issue number1
DOIs
Publication statusPublished - Jan 2014

Keywords

  • EXTENDING HIRSHFELD-I
  • BUFFER LAYERS
  • NANOSIZED CEO2-SIO2
  • CRYSTAL-STRUCTURES
  • CATALYSTS
  • CERIA
  • OXIDES
  • BEHAVIOR
  • GAS
  • GD

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