Rapid fabrication of micron-sized CVD-diamond structures by microfluidic contact printing

Thijs Vandenryt, Lars Grieten, Stoffel D. Janssens, Bart van Grinsven, Ken Haenen, Bart Ruttens, Jan D'Haen, Patrick Wagner, Ronald Thoelen, Ward De Ceuninck*

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

Abstract

In this contribution we report on a novel method for the growth of laterally patterned synthetic diamond films with submicron feature sizes. The lateral patterning is induced by depositing a nanodiamond-based seeding layer prior to the chemical vapor deposition of the diamond films. The seeding layer is prepared by a microfluidic approach, based on soft lithography with PDMS moulds, used in the microcontact printing. These moulds are prepared by electron-beam lithography of photoresist on silicon substrates. The master moulds are reusable, allowing for cheap, high-throughput manufacturing, and the resulting diamond microstructures exhibit an outstanding smoothness and structural reproducibility. Possible applications are expected in the fields of diamond electronics, micro-electro-mechanical systems (MEMS) as well as bio- and chemosensors. The abstract figure shows the SU-8 master mould (left). The resulting diamond structure (right) is shown, after chemical vapor deposition. The purple color originates from the settings of the optical microscope, used to get a high-contrast image. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

Original languageEnglish
Pages (from-to)1448-1454
Number of pages7
JournalPhysica Status Solidi A-applications and Materials Science
Volume211
Issue number6
DOIs
Publication statusPublished - Jun 2014
Externally publishedYes

Keywords

  • chemical vapor deposition
  • electron-beam lithography
  • micro- and nanowires
  • microfluidics
  • PDMS
  • soft lithography
  • synthetic diamond
  • NANOCRYSTALLINE DIAMOND
  • DNA
  • LITHOGRAPHY
  • GROWTH
  • FILMS

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