Abstract
In this contribution we report on a novel method for the growth of laterally patterned synthetic diamond films with submicron feature sizes. The lateral patterning is induced by depositing a nanodiamond-based seeding layer prior to the chemical vapor deposition of the diamond films. The seeding layer is prepared by a microfluidic approach, based on soft lithography with PDMS moulds, used in the microcontact printing. These moulds are prepared by electron-beam lithography of photoresist on silicon substrates. The master moulds are reusable, allowing for cheap, high-throughput manufacturing, and the resulting diamond microstructures exhibit an outstanding smoothness and structural reproducibility. Possible applications are expected in the fields of diamond electronics, micro-electro-mechanical systems (MEMS) as well as bio- and chemosensors. The abstract figure shows the SU-8 master mould (left). The resulting diamond structure (right) is shown, after chemical vapor deposition. The purple color originates from the settings of the optical microscope, used to get a high-contrast image. (C) 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Original language | English |
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Pages (from-to) | 1448-1454 |
Number of pages | 7 |
Journal | Physica Status Solidi A-applications and Materials Science |
Volume | 211 |
Issue number | 6 |
DOIs | |
Publication status | Published - Jun 2014 |
Externally published | Yes |
Keywords
- chemical vapor deposition
- electron-beam lithography
- micro- and nanowires
- microfluidics
- PDMS
- soft lithography
- synthetic diamond
- NANOCRYSTALLINE DIAMOND
- DNA
- LITHOGRAPHY
- GROWTH
- FILMS