TY - JOUR
T1 - Mechanical loss reduction at low temperature after crystallization in a titania-tantala film
AU - Murray, Peter G.
AU - Steinlechner, Jessica
AU - Isa, Hafizah Noor
AU - Cummings, Rebecca B.
AU - Robie, Raymond
AU - Craig, Kieran
AU - Abernathy, Matthew R.
AU - Bassiri, Riccardo
AU - Fejer, Martin M.
AU - Hough, James
AU - Maclaren, Ian
AU - Rowan, Sheila
AU - Martin, Iain W.
N1 - Funding Information:
We are grateful for financial support from STFC (Grants No. ST/L000946/1, No. ST/N005422/1, No. ST/V005634/1), the Royal Society (RG110331) and the University of Glasgow. I.\u2009W.\u2009M. was supported by a Royal Society Research Fellowship while working on this paper. We are thankful for funding of the Ph.D. of Hafizah Noor Isa by the Islamic International University of Malaysia (IIUM) and Ministry of Higher Education (MoHE) Malaysia. R.\u2009B.\u2009C. is grateful to the Engineering and Physical Sciences Research Council for funding a PhD studentship (No. EP/R513222/1). R.\u2009B. and M.\u2009M.\u2009F. acknowledge the support of the LSC Center for Coatings Research, jointly funded by the National Science Foundation (NSF) and the Gordon and Betty Moore Foundation (GBMF). In particular, the authors are grateful for support through NSF Awards No. PHY-1707866, No. PHY-1708175 and GBMF Grant No. 6793. J.\u2009S. acknowledges support by ETpathfinder (Interreg Vlaanderen-Nederland), E-TEST (Interreg Euregio Meuse-Rhine), the Dutch Research Council (NWO) Project No. VI.Vidi.203.062, and the Province of Limburg. We are grateful to the International Max Planck Partnership for Measurement and Observation at the Quantum Limit for support, and we thank our colleagues in the LSC and Virgo collaborations and within SUPA for their interest in this work. This paper has LIGO Document number LIGO-P2400213.
Publisher Copyright:
© 2025 authors. Published by the American Physical Society.
PY - 2025/2/15
Y1 - 2025/2/15
N2 - Due to its excellent optical properties, such as low absorption and scattering, amorphous Ta2O5 is commonly used as an optical coating material, often in combination with SiO2 layers to produce a highly reflective stack. However, the high mechanical loss of Ta2O5 limits the thermal-noise performance of such coatings when used in precision measurement applications. Doping with TiO2 has previously been shown to slightly reduce the mechanical loss, but it is still very high compared to many other materials, particularly at low temperatures. In this paper, we present a detailed study of different heat treatment temperatures and of Ti concentrations of up to nominally 75%. We show a significant mechanical-loss reduction for the mixture with the highest Ti cation content, which crystallized after heat treatment at 500°C. The resulting loss is much lower than that of pure TiO2 or that of Ta2O5 after crystallization, making further studies highly interesting, in particular investigations of scattering which may pose a major drawback for optical applications.
AB - Due to its excellent optical properties, such as low absorption and scattering, amorphous Ta2O5 is commonly used as an optical coating material, often in combination with SiO2 layers to produce a highly reflective stack. However, the high mechanical loss of Ta2O5 limits the thermal-noise performance of such coatings when used in precision measurement applications. Doping with TiO2 has previously been shown to slightly reduce the mechanical loss, but it is still very high compared to many other materials, particularly at low temperatures. In this paper, we present a detailed study of different heat treatment temperatures and of Ti concentrations of up to nominally 75%. We show a significant mechanical-loss reduction for the mixture with the highest Ti cation content, which crystallized after heat treatment at 500°C. The resulting loss is much lower than that of pure TiO2 or that of Ta2O5 after crystallization, making further studies highly interesting, in particular investigations of scattering which may pose a major drawback for optical applications.
U2 - 10.1103/PhysRevD.111.042005
DO - 10.1103/PhysRevD.111.042005
M3 - Article
SN - 1550-7998
VL - 111
JO - Physical Review D
JF - Physical Review D
IS - 4
M1 - 042005
ER -