Computationally guided in-vitro vascular growth model reveals causal link between flow oscillations and disorganized neotissue

E. E. Van Haaften, S. Quicken, W. Huberts, C. V. C. Bouten*, N. A. Kurniawan

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

Abstract

van Haaften et al. show numerical-experimental approach to reconstruct the graft-host response. They interrogate the mechanoregulation in dialysis grafts to solve the disturbed shear stress problem, which can be a cause of neointimal hyperplasia in blood vessels and grafts.

Disturbed shear stress is thought to be the driving factor of neointimal hyperplasia in blood vessels and grafts, for example in hemodialysis conduits. Despite the common occurrence of neointimal hyperplasia, however, the mechanistic role of shear stress is unclear. This is especially problematic in the context of in situ scaffold-guided vascular regeneration, a process strongly driven by the scaffold mechanical environment. To address this issue, we herein introduce an integrated numerical-experimental approach to reconstruct the graft-host response and interrogate the mechanoregulation in dialysis grafts. Starting from patient data, we numerically analyze the biomechanics at the vein-graft anastomosis of a hemodialysis conduit. Using this biomechanical data, we show in an in vitro vascular growth model that oscillatory shear stress, in the presence of cyclic strain, favors neotissue development by reducing the secretion of remodeling markers by vascular cells and promoting the formation of a dense and disorganized collagen network. These findings identify scaffold-based shielding of cells from oscillatory shear stress as a potential handle to inhibit neointimal hyperplasia in grafts.

Original languageEnglish
Article number546
Number of pages12
JournalCommunications Biology
Volume4
Issue number1
DOIs
Publication statusPublished - 10 May 2021

Keywords

  • WALL SHEAR-STRESS
  • ARTERIOVENOUS-FISTULAS
  • COLLAGEN
  • SIMULATION

Cite this